ILILT: Implicit Learning of Inverse Lithography Technologies

arXiv:2405.03574v1 Announce Type: new
Abstract: Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch. Inverse lithography technology (ILT) is one of the promising solutions to perform pre-fabrication optimization, termed mask optimization. Because of mask optimization problems' constrained non-convexity, numerical ILT solvers rely heavily on good initialization to avoid getting stuck on …

abstract arxiv chip chip design cs.lg design flow limitations manufacturing masks modern semiconductor semiconductor manufacturing silicon silicon wafer solutions systems technologies technology type