Oct. 31, 2022, 1:11 a.m. | Mingjie Liu, Haoyu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Selim Dogru, Anima Anandkumar, David Z. Pan, Brucek Khailany, Haoxing Ren

cs.LG updates on arXiv.org arxiv.org

Lithography modeling is a crucial problem in chip design to ensure a chip
design mask is manufacturable. It requires rigorous simulations of optical and
chemical models that are computationally expensive. Recent developments in
machine learning have provided alternative solutions in replacing the
time-consuming lithography simulations with deep neural networks. However, the
considerable accuracy drop still impedes its industrial adoption. Most
importantly, the quality and quantity of the training dataset directly affect
the model performance. To tackle this problem, we propose …

arxiv augmentation chip chip design data design framework sampling

Data Scientist (m/f/x/d)

@ Symanto Research GmbH & Co. KG | Spain, Germany

Enterprise Data Architect

@ Pathward | Remote

Diagnostic Imaging Information Systems (DIIS) Technologist

@ Nova Scotia Health Authority | Halifax, NS, CA, B3K 6R8

Intern Data Scientist - Residual Value Risk Management (f/m/d)

@ BMW Group | Munich, DE

Analytics Engineering Manager

@ PlayStation Global | United Kingdom, London

Junior Insight Analyst (PR&Comms)

@ Signal AI | Lisbon, Lisbon, Portugal