Machine Learning-enhanced Efficient Spectroscopic Ellipsometry Modeling. (arXiv:2201.04933v1 [cond-mat.mtrl-sci])

Over the recent years, there has been an extensive adoption of Machine
Learning (ML) in a plethora of real-world applications, ranging from computer
vision to data mining and drug discovery. In this paper, we utilize ML to
facilitate efficient film fabrication, specifically Atomic Layer Deposition
(ALD). In order to make advances in ALD process development, which is utilized
to generate thin films, and its subsequent accelerated adoption in industry, it
is imperative to understand the underlying atomistic processes. Towards this …

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