Tensor-based process control and monitoring for semiconductor manufacturing with unstable disturbances

With the development and popularity of sensors installed in manufacturing systems, complex data are collected during manufacturing processes, which brings challenges for traditional process control methods. This paper proposes a novel process control and monitoring method for the complex structure of high-dimensional image-based overlay errors (modeled in tensor form), which are collected in semiconductor manufacturing processes. The proposed method aims to reduce overlay errors using limited control recipes. We first build a high-dimensional process model and propose different tensor-on-vector regression …

challenges control cs.lg cs.sy data development eess.iv eess.sy errors form image manufacturing monitoring novel paper process processes semiconductor semiconductor manufacturing sensors stat.ml systems tensor